| US 7,462,851 B2 | ||
| Electromagnetic radiation source, lithographic apparatus, device manufacturing method and device manufactured thereby | ||
| Vadim Yevgenyevich Banine, Helmond (Netherlands); Vladimir Vitalevitch Ivanov, Moscow (Russian Federation); Konstantin Nikolaevitch Koshelev, Troitsk (Russian Federation); Robert Rafilevitch Gayazov, Troitsk (Russian Federation); and Vladimir Mihailovitch Krivtsun, Troitsk (Russian Federation) | ||
| Assigned to ASML Netherlands B.V., Veldhoven (Netherlands) | ||
| Filed on Sep. 22, 2006, as Appl. No. 11/525,224. | ||
| Claims priority of provisional application 60/719559, filed on Sep. 23, 2005. | ||
| Prior Publication US 2007/0069159 A1, Mar. 29, 2007 | ||
| Int. Cl. H01J 65/04 (2006.01) | ||
| U.S. Cl. 250—504R [378/119] | 18 Claims |
| 1. An electromagnetic radiation source comprising:
an anode and a cathode that define a discharge space;
a discharge material supply configured to provide a substance to the discharge space; and
a discharge power supply connected to the anode and the cathode and configured to create a discharge in said substance to
form a plasma so as to generate electromagnetic radiation having a spectral profile, wherein said substance comprises a first
and a second multiplicity of elements such that the elements of the first multiplicity substantially determine the spectral
profile, and the elements of the second multiplicity have a lower atomic weight than the elements of the first multiplicity.
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