US 7,462,850 B2
	Radical cleaning arrangement for a lithographic apparatus
Vadim Yevgenyevich Banine, Helmond (Netherlands); Vladimir Vitalevitch Ivanov, Moscow (United Kingdom); Johannes Hubertus Josephina Moors, Helmond (Netherlands); Bastiaan Theodoor Wolschrijn, Abcoude (Netherlands); Derk Jan Wilfred Klunder, Geldrop (Netherlands); and Maarten Marinus Johannes Wilhelmus Van Herpen, Heesch (Netherlands)
Assigned to ASML Netherlands B.V., Veldhoven (Netherlands)
Filed on Dec. 08, 2005, as Appl. No. 11/296,702.
Prior Publication US 2007/0145295 A1, Jun. 28, 2007
Int. Cl. H05G 2/00 (2006.01)

U.S. Cl. 250—504R  [250/492.1; 250/492.2; 250/493.1]

13 Claims

1. A cleaning arrangement configured to clean an optic from contamination by supplying hydrogen radicals, or halogen molecules, or both, wherein a partial pressure of the radicals/molecules ranges between 0.1-10 Pa.