| US 7,580,114 B2 | ||
| Exposure apparatus and method for manufacturing device | ||
| Hiroyuki Nagasaka, Kumagaya (Japan) | ||
| Assigned to Nikon Corporation, Tokyo (Japan) | ||
| Filed on Jul. 31, 2007, as Appl. No. 11/882,206. | ||
| Application 11/882206 is a division of application No. 11/325654, filed on Jan. 05, 2006, granted, now 7,379,157. | ||
| Application 11/325654 is a continuation of application No. PCT/JP2004/009999, filed on Jul. 07, 2004. | ||
| Claims priority of application No. 2003-272616 (JP), filed on Jul. 09, 2003. | ||
| Prior Publication US 2008/0018873 A1, Jan. 24, 2008 | ||
| Int. Cl. G03B 27/42 (2006.01); G03B 27/58 (2006.01); G03B 27/52 (2006.01) | ||
| U.S. Cl. 355—53 [355/72; 355/55] | 20 Claims |
| 1. An exposure apparatus which exposes a substrate by projecting an image of a pattern through a liquid onto the substrate,
the exposure apparatus comprising:
a projection optical system which projects the image of the pattern onto the substrate;
a liquid supply mechanism which has supply ports for supply of the liquid; and
a substrate-moving unit which moves the substrate, wherein:
the supply of the liquid by the liquid supply mechanism is started while moving the substrate with the substrate-moving unit.
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