	US 7,574,278 B2
	Scheduling system and method
James Heskin, Richardson, Tex. (US); Mark Shepheard, Garland, Tex. (US); and Julia Lafoy, Dallas, Tex. (US)
Assigned to Texas Instruments Incorporated, Dallas, Tex. (US)
Filed on Jul. 29, 2008, as Appl. No. 12/181,706.
Application 12/181706 is a continuation of application No. 10/640438, filed on Aug. 13, 2003, granted, now 7,426,419.
Prior Publication US 2008/0281454 A1, Nov. 13, 2008
This patent is subject to a terminal disclaimer.
Int. Cl. G06F 19/00 (2006.01); G06F 9/46 (2006.01); G05B 19/418 (2006.01); G06G 1/14 (2006.01); G06Q 20/00 (2006.01); G06Q 10/00 (2006.01)

U.S. Cl. 700—101 [700/96; 700/102; 700/103; 700/111; 700/114; 700/121; 705/8; 705/22; 705/28]

8 Claims

1. An apparatus for scheduling in a wafer fab, comprising:

(a) means for weighting inventories according to at least one of logpoints or reticle, and photolithography units;

(b) means for scheduling one of said inventories on one of said photolithography units, wherein said one of said inventories has a maximal weighting; and