US 7,571,697 B2
	Plasma processor coil
Neil Benjamin, Palo Alto, Calif. (US); and David Cooperberg, Mount Kisco, N.Y. (US)
Assigned to Lam Research Corporation, Fremont, Calif. (US)
Filed on Sep. 13, 2002, as Appl. No. 10/242,795.
Claims priority of provisional application 60/322581, filed on Sep. 14, 2001.
Prior Publication US 2003/0067273 A1, Apr. 10, 2003
Int. Cl. C23C 16/00 (2006.01); C23F 1/00 (2006.01); H01L 21/306 (2006.01)

U.S. Cl. 118—723I  [156/345.48]

49 Claims

1. A coil for a plasma processor, the coil comprising excitation terminals for connection to opposite first and second terminals of RF excitation circuitry, at least one winding connected to said first and second excitation terminals, and a shorting turn coupled to the at least one winding, the at least one winding extending in generally radial and circumferential directions between inner and peripheral portions of the coil, the at least one winding having an inner most portion directly connected to the first excitation terminal, and the turn being coupled to the innermost portion of the coil.