| US 7,550,927 B2 | ||
| System and method for generating ions and radicals | ||
| Michael W. Stowell, Loveland, Colo. (US); Guenter Klemm, Nidda (Germany); Hans-Georg Lotz, Gründau-Rothenbergen (Germany); and Volker Hacker, Altenstadt (Germany) | ||
| Assigned to Applied Materials, Inc., Santa Clara, Calif. (US) | ||
| Filed on Nov. 09, 2006, as Appl. No. 11/558,309. | ||
| Prior Publication US 2008/0111490 A1, May 15, 2008 | ||
| Int. Cl. H05B 13/32 (2006.01) | ||
| U.S. Cl. 315—111.81 [315/111.91] | 13 Claims |
| 1. A system for producing ions, the system comprising:
an outer electrode with a discharge chamber;
an inner electrode positioned inside the discharge chamber, the inner electrode positioning forming a upper portion of the
discharge chamber and a lower portion of the discharge chamber; and
a gas inlet positioned in the lower portion of the discharge chamber;
wherein a plasma formed within the lower portion of the discharge chamber provides priming particles usable to form a plasma
in the upper portion of the discharge chamber.
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