| US 7,550,247 B2 | ||
| Resist composition and patterning process | ||
| Mutsuo Nakashima, Joetsu (Japan); Yoshitaka Hamada, Joetsu (Japan); Katsuya Takemura, Joetsu (Japan); Kazumi Noda, Joetsu (Japan); and Toshihiko Fujii, Joetsu (Japan) | ||
| Assigned to Shin-Etsu Chemical Co., Ltd., Tokyo (Japan) | ||
| Filed on Aug. 18, 2005, as Appl. No. 11/205,980. | ||
| Claims priority of application No. 2004-239634 (JP), filed on Aug. 19, 2004; and application No. 2005-038701 (JP), filed on Feb. 16, 2005. | ||
| Prior Publication US 2006/0040206 A1, Feb. 23, 2006 | ||
| This patent is subject to a terminal disclaimer. | ||
| Int. Cl. G03C 1/73 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01); G03F 7/36 (2006.01) | ||
| U.S. Cl. 430—270.1 [430/325; 430/326; 430/311; 430/313; 430/907] | 8 Claims |
| 1. A resist composition comprising:
(A) a silicone resin,
(B) a photoacid generator,
(C) a nitrogen-containing organic compound, and
(D) a solvent,
said silicone resin (A) being obtained through cohydrolytic condensation of a mixture comprising hydrolyzable silane monomers
having the general formulae (1), (2) and (3) and another hydrolyzable monomer having at least two hydrolyzable substituent
groups:
R1R2pSiX3−p (1)
R3R4qSiX3−q (2)
R5R6rSiX3−r (3)
wherein R1 is a C3-C20 organic group with a straight, branched, cyclic or polycyclic structure which has a hydroxyl group on a carbon atom as a functional
group, which has at least 3 fluorine atoms, in total, on a carbon atom bonded to the hydroxyl-bonded carbon atom, and which
may further contain a halogen, oxygen or sulfur atom, R2 is a C1-C6 hydrocarbon group having a straight, branched or cyclic structure,
R3 is a C3-C20 organic group with a straight, branched, cyclic or polycyclic structure which has a carboxyl group as a functional group,
said carboxyl group being protected with an acid-decomposable protecting group, and which may further contain a halogen, oxygen
or sulfur atom, R4 is as defined for R2,
R5 is a C4-C16 organic group which has a lactone ring as a functional group, and which may further contain a halogen, oxygen or sulfur atom,
R6 is as defined for R2, and
X is a hydrogen atom, chlorine atom, bromine atom, or straight, branched or cyclic C1-C 6 alkoxy group, p is 0 or 1, q is 0 or 1, and r is 0 or 1.
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