US 7,514,037 B2
AG base alloy thin film and sputtering target for forming AG base alloy thin film
Yuuki Tauchi, Kobe (Japan); Katsutoshi Takagi, Kobe (Japan); Junichi Nakai, Kobe (Japan); and Toshiki Sato, Kobe (Japan)
Assigned to Kobe Steel, Ltd., Kobe-shi (Japan)
Filed on Aug. 05, 2003, as Appl. No. 10/633,550.
Claims priority of application No. 2002-231596 (JP), filed on Aug. 08, 2002; application No. 2002-233283 (JP), filed on Aug. 09, 2002; application No. 2002-239972 (JP), filed on Aug. 20, 2002; application No. 2002-361117 (JP), filed on Dec. 12, 2002; application No. 2003-003643 (JP), filed on Jan. 09, 2003; application No. 2003-004586 (JP), filed on Jan. 10, 2003; and application No. 2003-122314 (JP), filed on Apr. 25, 2003.
Prior Publication US 2004/0028912 A1, Feb. 12, 2004
This patent is subject to a terminal disclaimer.
Int. Cl. C22C 5/06 (2006.01)
U.S. Cl. 420—501  [148/430; 428/673; 428/64.4] 14 Claims
OG exemplary drawing
 
1. An optical information recording medium, comprising:
a substrate and
a first reflective layer on the substrate, wherein the first reflective layer comprises a silver base alloy; and wherein the silver base alloy of the first reflective layer consists of silver and 0.005 to 0.4 atom % of bismuth.